8:30am-4:30pm, Thursday, May 21, 2015, Marriott Uptown, Albuquerque, NM
- Understand CVD for integrated-circuit applications.
- Know the characteristics and processes of various reactor types, including cold-wall and hot-wall CVD reactors.
- Learn about the properties of CVD layers and how they are affected by the deposition processes.
Following an introduction to the kinetics of CVD, including gas-phase and surface processes, the practical aspects of CVD are emphasized. The various reactors used for CVD are discussed with special emphasis on contrasting cold-wall and hot-wall reactors. A discussion of the methods for achieving uniformity in each of these reactors illustrates the differing importance of gas-phase and surface processes. Most of the remainder of the day is devoted to considering the properties of the layers important in IC applications and how they are influenced by the deposition process.
Epitaxial and polycrystalline silicon and deposited dielectrics are described. The concept of plasma-enhanced CVD is introduced, and materials deposited by PECVD are described. The day concludes with consideration of the CVD process and properties of CVD metals and refractory metal silicides. Copies of the visuals used in the course will be supplied to participants.
Who Should Attend?
Engineers and technologists who want an introduction to CVD or to broaden or update their knowledge of the increasingly important field of CVD for integrated-circuit applications.
Instructor: John Crowell, Professor of Chemistry and Biochemistry at the University of California, San Diego
John E. Crowell is a Professor of Chemistry and Biochemistry at the University of California, San Diego. He received his B.S. in chemistry from the University of Illinois, Urbana, in 1979 and his Ph.D. in physical chemistry under the direction of G. A. Somorjai from the University of California at Berkeley in 1984. He joined the faculty at the University of California, San Diego, in 1986 after postdoctoral research with J. T. Yates, Jr., and D. M. Hercules at the University of Pittsburgh. His research program is primarily focused on surface processes that govern thin film formation, including the kinetics of chemical reactions at semiconductor surfaces, the mechanism of dielectric and semiconductor thin film growth, photo-assisted deposition and desorption processes, and biomolecule analysis using nanoporous Group IV materials. He has taught often in the areas of General Chemistry, Physical Chemistry, Surface Processes, and Spectroscopy.