Evaporation for Thin Film Deposition

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Date:

8:30am-4:30pm, Monday, June 3, 2019, Sheraton Albuquerque Airport Hotel, Albuquerque, NM

Course Objectives

  • Learn about a broad range of evaporation techniques: technology and fundamentals
  • Understand evaporation mechanisms
  • Review of gas kinetics
  • Evaporation and equilibrium vapor pressure (thermodynamics and kinetics)
  • Thermal and electron beam evaporation sources: materials issues
  • Deposition rate monitors: advantages and disadvantages
  • Evaporation of alloys and compounds: kinetics and materials considerations
  • MBE (solid source and gas source): system design and film growth kinetics
  • The role of energetic particles: ion plating, ion-beam assisted deposition, etc.
  • Processes controlling film growth and properties
  • Stress evolution in evaporated films

Course Description

Thermal evaporation is employed in a very wide variety of film-growth processing technologies with applications ranging from optics, magnetics, and microelectronics to wear and corrosion resistance to functional and decorative coatings. This course provides an understanding of thermal evaporation and related processes; the relationship between evaporation rate and vapor pressure; flux directionality; and film thickness uniformity. Advantages and disadvantages of common and specialized evaporation sources including filaments, boats, effusion cells, Knudsen cells, and electron beam sources are described with examples. Reactive evaporation of compounds such as oxides, nitrides, sulfides, etc. is compared with ion-assisted techniques including ion plating, activated-reactive evaporation, pulsed-laser deposition, and vacuum-arc deposition for compositional control of complex materials. The use of in-situ deposition rate monitors including quartz crystal oscillators and optical spectroscopy is also covered.
Fundamental aspects, as well as the technology, of thin film nucleation and growth by evaporation are discussed and highlighted with many examples.

Who Should Attend?

Scientists, engineers, students, technicians, and others involved in the deposition of thin films by evaporation who want to understand the effects of operating parameters on the properties of metal, semiconductor, compound, and alloy films.

Instructor: Joe Greene, University of Illinois

Joe Greene is the D.B. Willett Professor of Materials Science and Physics at the University of Illinois and the Tage Erlander Professor of Materials Physics at Linköping University, Sweden. The focus of his research has been the development of an atomic-level understanding of adatom/surface interactions during the dynamic process of vapor-phase crystal growth in order to controllably manipulate nanochemistry, nanostructure, and, hence, physical properties. His work has involved nanotechnology and film growth by all forms of sputter deposition, solid and gas-source MBE, UHV-CVD, MOCVD, and ALE. Joe has published more than 500 papers and review articles, 22 book chapters, and co-edited 4 books in the general areas of crystal growth, thin-film physics, and surface science. He is currently Editor-in-Chief of Thin Solid Films and past Editor of CRC Critical Reviews in Solid State and Materials Sciences. Joe is active in the AVS where he has served on the Trustees, twice as a member of the Board of Directors, as President of the society in 1989, and is currently Secretary.

Major awards include: the AVS John Thornton Award (1991), the Tage Erlander Award (1991) from the Swedish Natural Science Research Council, Fellow of the American Vacuum Society (1993), Technical Excellence Award from the Semiconductor Research Corporation (1994), 1996 DOE Award for Sustained Outstanding Research, 1998 David Adler Award in Materials Physics from the American Physical Society, 1998 Aristotle Award from SRC, Fellow of the American Physical Society (1998), AVS Distinguished Lecturer (1998-present), David Turnbull Award form the Materials Research Society (1999), 2001 International Scientist of the Year, Elected to the European Academy of Science in 2002, and Elected to the US National Academy of Engineering in 2003.

Course Materials

Course Notes.

Cost: $690.00

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