Plasma-Enhanced Chemical Vapor Deposition


8:30am-4:30pm, Monday, May 18, 2020, Sheraton Albuquerque Airport Hotel, Albuquerque, NM

Course Objectives

  • Learn why, where and how PECVD is used in industrial applications ranging from solar photovoltaics and semiconductors to hard coatings.
  • Understand how the process variables affect the properties of materials and device performance.
  • Learn and understand the basics of plasma equipment design and operation.
  • Get a broad overview of current manufacturing equipment and fabrication processes.

Course Description:

This course starts with a brief review of the basics of processing plasmas. This knowledge is then applied to the plasma deposition of thin films in practical device applications. The unique aspects of PECVD are emphasized by an in-depth comparison of PECVD with other deposition technologies. The relationship between process parameters and film properties is illustrated by reviewing several important device applications of PECVD.

The deposition and properties of important materials such as silicon oxide, silicon nitride, silicon carbide, amorphous and polycrystalline silicon, diamond and diamond-like carbon are discussed in detail.

Much emphasis is placed on an up-to-date discussion of hardware and hardware considerations as these apply to process control and process safety.

Important trends in the design and operation of commercial equipment, particularly as it relates to microelectronics, are discussed in detail.

Who Should Attend?

Those who want to get a good understanding of plasma-based deposition techniques, materials, and devices both in commercial and laboratory applications.

Instructor: Robert Grubbs

Dr. Robert K. Grubbs  received his B.S. degree in chemistry at Clarkson University in 1990 and his M.S. degree in physical chemistry from University of California, Berkeley. He pursued his Ph.D. in physical chemistry under the direction of Dr. Steve George, at the University of Colorado in Boulder,  in the area of atomic layer deposition (ALD). His research involved the nucleation and growth of ALD metal films. After graduating in 2003, he became a Postdoctoral Researcher at Sandia National Laboratories in New Mexico studying the pressure induced phase behavior of complex perovskite materials. During his subsequent ten year tenure at Sandia he was responsible for the installation and management of the ALD facilities and directed ALD materials research for various energy and national security applications. He is presently working as a Research Scientist at  Micron Technology applying ALD  to memory development. He has been involved in ALD research for the last fifteen years and has taught his ALD short course for the New Mexico Chapter of AVS for the last eight years.

Course Materials

Course notes

Cost:  $690, or $50 for full time university student

 Full Short Course List

Register to attend short courses HERE.