8:30am-4:30pm, Wednesday, May 25, 2016, Sheraton Albuquerque Airport Hotel, Albuquerque, NM
- Understand reactive processes for doping films.
- Learn about deposition methods and applications.
- Know the methods for sputtering insulators: AC, RF, Pulsed DC, ion beams, etc.
- Understand process monitoring and control methods as well as process modeling.
This course is intended for those who have taken the basic Sputter Deposition course or who have an equivalent background in sputtering. Familiarity with different sputtering methods (magnetrons, RF, etc.) and the parameters (pressure, energy, etc.) that affect film properties (stress, structure, etc.) is required. The course provides an understanding of the fundamental parameters and effects that are important in particular applications and helps attendees recognize from experimental results those that determine the film properties, whatever the film and the desired properties may be.
Because applications of reactive sputtering have expanded significantly in the last decade for optical coating and optical waveguides, decorative coatings, hard coatings, magnetic films, etc., and because industrial-scale manufacturing has focused on the materials and methods of deposition, this course will cover these topics in detail. This course will also focus on:
- Gettering effects and hysteresis of pressure, target voltage, deposition rate; the effect of pumping speed.
- Target processes in sputtering compounds; ejected species.
- Partially reacted target methods for high rates; avoiding arcing and defects; activation of reactions.
Who Should Attend?
Scientists, technicians, and others who have taken the basic Sputter Deposition course or who have an equivalent background in sputtering and are looking for more information on reactive sputtering processes. Familiarity with different sputtering methods and the parameters that affect film properties is required.
Instructor: Joe Greene, University of Illinois
Joe Greene is the D.B. Willett Professor of Materials Science and Physics at the University of Illinois and the Tage Erlander Professor of Materials Physics at Linköping University, Sweden. The focus of his research has been the development of an atomic-level understanding of adatom/surface interactions during the dynamic process of vapor-phase crystal growth in order to controllably manipulate nanochemistry, nanostructure, and, hence, physical properties. His work has involved nanotechnology and film growth by all forms of sputter deposition, solid and gas-source MBE, UHV-CVD, MOCVD, and ALE. Joe has published more than 500 papers and review articles, 22 book chapters, and co-edited 4 books in the general areas of crystal growth, thin-film physics, and surface science. He is currently Editor-in-Chief of Thin Solid Films and past Editor of CRC Critical Reviews in Solid State and Materials Sciences. Joe is active in the AVS where he has served on the Trustees, twice as a member of the Board of Directors, as President of the society in 1989, and is currently Secretary.
Major awards include: the AVS John Thornton Award (1991), the Tage Erlander Award (1991) from the Swedish Natural Science Research Council, Fellow of the American Vacuum Society (1993), Technical Excellence Award from the Semiconductor Research Corporation (1994), 1996 DOE Award for Sustained Outstanding Research, 1998 David Adler Award in Materials Physics from the American Physical Society, 1998 Aristotle Award from SRC, Fellow of the American Physical Society (1998), AVS Distinguished Lecturer (1998-present), David Turnbull Award form the Materials Research Society (1999), 2001 International Scientist of the Year, Elected to the European Academy of Science in 2002, and Elected to the US National Academy of Engineering in 2003.