Sputter Deposition

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Dates:

8:30am-4:30pm, Tuesday and Wednesday, June 4-5, 2019, Sheraton Albuquerque Airport Hotel, Albuquerque, NM

Course Objectives

  • Understand target effects and sputtered atoms.
  • Learn about magnetron, diode, triode, and ion beam systems.
  • Learn about DC and RF systems for targets and substrates.
  • Understand reactive sputtering.
  • Understand film properties and learn system parameters.

Course Description

Films are deposited by sputtering for their useful properties in microelectronics, surface protection, optics, etc., by a variety of sputtering techniques. The film properties depend on the parameters of the sputtering system, such as pressure and substrate bias.

This course provides an understanding of the cause and effect of changes in sputtering parameters on the energetics of the sputtering and deposition processes and their relationship to film properties. The energy and distribution of species ejected from the target are discussed. The effect of the sputtering system on material transport to the substrate and subsequent film deposition is also discussed for films of metals, alloys, and compounds. The parameters of different sputtering systems (diode, triode, magnetron, and ion guns) with DC and RF power supplies are discussed with respect to film properties.

Who Should Attend?

Scientists, technicians, and others involved in the deposition of thin films by sputtering who want to understand the effects of operating parameters on the properties of metal, alloy, and dielectric films.

Instructor

Joe Greene University of Illinois

Course Materials

Course Notes

Cost

$1020.00

Joe Greene is the D.B. Willett Professor of Materials Science and Physics at the University of Illinois and the Tage Erlander Professor of Materials Physics at Linköping University, Sweden. The focus of his research has been the development of an atomic-level understanding of adatom/surface interactions during the dynamic process of vapor-phase crystal growth in order to controllably manipulate nanochemistry, nanostructure, and, hence, physical properties. His work has involved nanotechnology and film growth by all forms of sputter deposition, solid and gas-source MBE, UHV-CVD, MOCVD, and ALE. Joe has published more than 500 papers and review articles, 22 book chapters, and co-edited 4 books in the general areas of crystal growth, thin-film physics, and surface science. He is currently Editor-in-Chief of Thin Solid Films and past Editor of CRC Critical Reviews in Solid State and Materials Sciences. Joe is active in the AVS where he has served on the Trustees, twice as a member of the Board of Directors, as President of the society in 1989, and is currently Secretary.

Major awards include: the AVS John Thornton Award (1991), the Tage Erlander Award (1991) from the Swedish Natural Science Research Council, Fellow of the American Vacuum Society (1993), Technical Excellence Award from the Semiconductor Research Corporation (1994), 1996 DOE Award for Sustained Outstanding Research, 1998 David Adler Award in Materials Physics from the American Physical Society, 1998 Aristotle Award from SRC, Fellow of the American Physical Society (1998), AVS Distinguished Lecturer (1998-present), David Turnbull Award form the Materials Research Society (1999), 2001 International Scientist of the Year, Elected to the European Academy of Science in 2002, and Elected to the US National Academy of Engineering in 2003.